14 December 2024

Spin Coating is a method based on depositing a liquid material onto a surface and rotating the surface at high speed to apply the coating. This technique is widely used in semiconductor technologies for photolithographic resist coating, integrating desired properties into lenses and optical surfaces, as well as in nanotechnology and microelectronics.

Key Features:

• Digital Process Controller: 100-8000 RPM with 0.5 RPM resolution
• Sample Holders: For samples with diameters ranging from 2” to 6” (50 mm – 150 mm), with O-rings reducing the size of the holder from 11 mm x 11 mm to 20 mm x 20 mm
• Maximum Rotational Speed: 12,000 RPM
• Motor Speed Accuracy: < ± 1% deviation
• Speed Adjustment Precision: < 0.2 RPM
• High Precision Digital Controller: Operates with PLC control and adjustment point accuracy of less than 0.006%
• Process Time per Step: 1-5999.9 seconds
• Program Control: Can store up to 20 program segments, with 51 adjustable speed settings for each segment

Part Adapters:

• Microscope Slide Adapter: For 1” × 3” microscope slides
• Sample Alignment Tool
• O-rings for general solvent systems (EPDM) and for systems like CH2Cl2, Chloroform, THF, and Toluene (Viton O-rings)

Power Requirements:

• Voltage: 220-240 VAC
• Frequency: 50/60 Hz
• Power Consumption: Approximately 300 Watts

Vacuum Requirements:

• Vacuum Level: 25-28 inHg (~635-711 mmHg)
• Pumping Speed: 4.5 SCFM (0.127 m³/min)
• Vacuum Pump: Oil-free system

Environment and Safety:

• Operating Temperature: 5°C to 40°C
• Certifications: NIST Certified, CE and RoHS Compliance

Control Panel:

• User-friendly interface with an LCD screen and membrane switches